Inside China’s ‘Manhattan Project’: China Moves Closer to Chip Self-Reliance With Secret EUV Prototype
PositiveArtificial Intelligence
- China is advancing its efforts toward chip self-reliance by testing a secret extreme ultraviolet (EUV) lithography prototype, a critical technology for semiconductor manufacturing, amid increasing export controls and rising demand for artificial intelligence (AI) technologies.
- This development is significant as it represents a pivotal step for China in reducing its dependency on foreign technology, particularly in the semiconductor sector, which is essential for powering AI applications and other advanced technologies.
- The move comes at a time when the U.S. is loosening restrictions on the export of AI chips to China, reflecting a complex interplay of competition and collaboration in the global tech landscape, as China also seeks to bolster its domestic chip production capabilities in response to international pressures.
— via World Pulse Now AI Editorial System


